Design of binary masks for extreme ultraviolet lithography with deep ultraviolet inspection by using a simple method

✍ Scribed by Sungjin Park; Pazhanisami Peranantham; Hee Young Kang; Chang Kwon Hwangbo

• Book ID: 115076835
• Publisher: The Korean Physical Society
• Year: 2012
• Tongue: English
• Weight: 280 KB
• Volume: 60
• Category: Article
• ISSN: 0374-4884
• DOI: 10.3938/jkps.60.1305