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Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry-Perot interference filter

✍ Scribed by Kang, Hee Young ;Hwangbo, Chang Kwon


Book ID
115353839
Publisher
The Optical Society
Year
2007
Tongue
English
Weight
702 KB
Volume
47
Category
Article
ISSN
1559-128X

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