Depth profiling using C60+ SIMS—Deposition and topography development during bombardment of silicon

✍ Scribed by Greg Gillen; James Batteas; Chris A. Michaels; Peter Chi; John Small; Eric Windsor; Albert Fahey; Jennifer Verkouteren; K.J. Kim

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 767 KB
• Volume: 252
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2006.02.234