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Depth profiles of secondary defects of As+ and BF2+ implanted silicon measured by a thermal wave technique

โœ Scribed by Katsuya Ishikawa; Masakatsu Yoshida; Mono Inoue


Book ID
113279663
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
317 KB
Volume
37-38
Category
Article
ISSN
0168-583X

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