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A review of rapid thermal annealing (RTA) of B, BF2 and As ions implanted into silicon

✍ Scribed by T.E. Seidel; D.J. Lischner; C.S. Pai; R.V. Knoell; D.M. Maher; D.C. Jacobson

Book ID: 113277268
Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 919 KB
Volume: 7-8
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(85)90562-2

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