Chemical bonding and interface analysis of ultrathin silicon-nitride layers produced by ion implantation and Electron Beam Rapid Thermal Annealing (EB-RTA)

✍ Scribed by A. Markwitz; H. Baumann; E. F. Krimmel; R. W. Michelmann; C. Maurer; E. C. Paloura; A. Knop; K. Bethge

• Publisher: Springer
• Year: 1994
• Tongue: English
• Weight: 443 KB
• Volume: 59
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/bf00331725