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Depth profiles of boron in IPI amorphous silicon films with (p, α) resonance reaction

✍ Scribed by Liao Changgeng; Zheng Zhilao; Wang Yongqiang; Jiang Bianying

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 193 KB
Volume: 42
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(91)90932-9

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