Study of boron depth profiles in IPI amorphous silicon films after thermal annealing using the (p, α) reaction

✍ Scribed by Changgeng Liao; Zhihao Zheng; Yongqiang Wang; Shengsheng Yang; Hui Jiang

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 316 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)90187-n