Depth profiles of Al impurities implanted in Si wafers determined by means of the high-resolution grazing emission X-ray fluorescence technique

✍ Scribed by Y. Kayser; D. Banaś; W. Cao; J.-Cl. Dousse; J. Hoszowska; P. Jagodziński; M. Kavčič; A. Kubala-Kukuś; S. Nowak; M. Pajek; J. Szlachetko

• Book ID: 108261765
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 299 KB
• Volume: 65
• Category: Article
• ISSN: 0584-8547
• DOI: 10.1016/j.sab.2010.02.013