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Deposition properties of selective tungsten chemical vapor deposition

✍ Scribed by Wen-Kuan Yeh; Mao-Chieh Chen; Pei-Jan Wang; Lu-Min Liu; Mou-Shiung Lin


Book ID
113300740
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
394 KB
Volume
45
Category
Article
ISSN
0254-0584

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Chemical vapor deposition of tungsten ox
✍ Rein U. Kirss; Lamartine Meda πŸ“‚ Article πŸ“… 1998 πŸ› John Wiley and Sons 🌐 English βš– 117 KB πŸ‘ 1 views

Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 Β°C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W