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Deposition of titanium nitride layers by electric arc – Reactive plasma spraying method

✍ Scribed by Şerban, Viorel-Aurel; Roşu, Radu Alexandru; Bucur, Alexandra Ioana; Pascu, Doru Romulus

Book ID: 118415774
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 647 KB
Volume: 265
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2012.10.187

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## Abstract High‐quality titanium nitride (TiN) films with nano‐structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in‐plane “S” filter. The effects of substrate bias and argon flux on the crystal grain size, roughness