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Sub-micron synthesis of Di-titanium nitride coatings by cathodic arc plasma deposition technique

✍ Scribed by Z. Iqbal; A. Ali; A. Rauf; A. ul Haq; S. Tajammul Hussain; M. H. Asghar


Book ID
111476045
Publisher
Pleiades Publishing
Year
2011
Tongue
English
Weight
394 KB
Volume
47
Category
Article
ISSN
2070-2051

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Effects of substrate bias and argon flux
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## Abstract High‐quality titanium nitride (TiN) films with nano‐structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in‐plane “S” filter. The effects of substrate bias and argon flux on the crystal grain size, roughness