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Deposition of TiO2on heated substrates by the spray-inductively-coupled-plasma technique

✍ Scribed by Y. Mizoguchi; M. Kagawa; Y. Syono; T. Hirai

Publisher
Springer
Year
1993
Tongue
English
Weight
410 KB
Volume
12
Category
Article
ISSN
0261-8028

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## Abstract Titanium dioxide (TiO~2~) films are produced by inductively coupled plasma‐assisted (ICP) CVD at various H~2~ flow rates. Anatase and rutile TiO~2~ films are obtained without any external heating. The surface morphologies, structures, and deposition rates of the TiO~2~ films are strongl