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Deposition of nanocrystalline silicon films (nc-Si:H) from a pure ECWR-SiH4 plasma

✍ Scribed by M. Scheib; B. Schröder; H. Oechsner

Book ID: 115991106
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 296 KB
Volume: 198-200
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(96)00078-6

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