𝔖 Bobbio Scriptorium

✦ LIBER ✦

Deposition of microcrystalline silicon films at ultrafast rate by using a new microwave induced plasma source

✍ Scribed by Haijun Jia; Hiroshi Kuraseko; Michio Kondo

Book ID: 116670917
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 174 KB
Volume: 354
Category: Article
ISSN: 0022-3093
DOI: 10.1016/j.jnoncrysol.2007.09.071

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Silicon carbonitride thin-film coatings

Silicon carbonitride thin-film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

✍ A. M. Wrobel; I. Blaszczyk-Lezak; A. Walkiewicz-Pietrzykowska 📂 Article 📅 2007 🏛 John Wiley and Sons 🌐 English ⚖ 161 KB 👁 2 views

Morphology and semiconducting properties

Morphology and semiconducting properties of homoepitaxially grown phosphorus-doped (1 0 0) and (1 1 1) diamond films by microwave plasma-assisted chemical vapor deposition using triethylphosphine as a dopant source

✍ Takeyasu Saito; Masanori Kameta; Katsuki Kusakabe; Shigeharu Morooka; Hideaki Ma 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 548 KB