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Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique

✍ Scribed by Hrunski, D.; Mootz, F.; Zeuner, A.; Janssen, A.; Rost, H.; Beckmann, R.; Binder, S.; Schüngel, E.; Mohr, S.; Luggenhölscher, D.; Czarnetzki, U.; Grabosch, G.

Book ID: 122640628
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 436 KB
Volume: 87
Category: Article
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2012.02.020

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