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Deposition of magnetic thin films by IBAD

✍ Scribed by T Šikola; J Spousta; L Dittrichová; M Stránský; J Zlámal; F Matějka; A Nebojsa; J Zemek; V Peřina; D Rafaja; L Ranno

Book ID
114170759
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
121 KB
Volume
148
Category
Article
ISSN
0168-583X

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Effect of the deposition rate on ITO thi
Effect of the deposition rate on ITO thin film properties prepared by ion beam assisted deposition (IBAD) technique
✍ Meng, Li-Jian ;Teixeira, V. ;dos Santos, M. P. 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 507 KB

## Abstract Indium tin oxide (ITO) thin films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique at different deposition rates (0.1–0.3 nm/s). The effects of the deposition rate on the structural, optical and electrical properties of the deposite