𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Deposition of highly pure ruthenium thin films with a new metal-organic precursor

✍ Scribed by Julien Gatineau; Christian Dussarrat

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
311 KB
Volume
201
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.

✦ Synopsis

Ruthenium films of high purity were obtained by using a new precursor, dubbed CHORUS. This metal-organic precursor, liquid down to -50 Β°C, of low viscosity, can be fully vaporized without leaving residues at 80 Β°C. Ruthenium CVD films were obtained at temperatures of 250 Β°C and above using hydrogen as a reducing co-reactant. The CHORUS process has the characteristic of enabling deposition of pure ruthenium films without oxidizing the layer upon which the ruthenium film is grown. The obtained films show good adherence on many different types of substrates and no incubation times were observed for the depositions.

πŸ“œ SIMILAR VOLUMES

Approach to control deposition of ultra
Approach to control deposition of ultra thin films from metal organic precursors: Ru deposition
✍ Igor K. Igumenov; Pyotr P. Semyannikov; Sergei V. Trubin; Natalia B. Morozova; N πŸ“‚ Article πŸ“… 2007 πŸ› Elsevier Science 🌐 English βš– 775 KB

Atomic layer deposition (ALD) processes have attracted attention during the past decade as a method allowing one to obtain high-quality thin films of various materials including metal oxides, metal nitrides and pure metals. Here we investigated a novel pulse method for the deposition of ultra thin f

Highly Volatile, Low Melting, Fluorine-F
Highly Volatile, Low Melting, Fluorine-Free Precursors for Metal-Organic Chemical Vapor Deposition of Lanthanide Oxide-Containing Thin Films
✍ John A. Belot; Anchuan Wang; Richard J. McNeely; Louise Liable-Sands; Arnold L. πŸ“‚ Article πŸ“… 1999 πŸ› John Wiley and Sons 🌐 English βš– 369 KB πŸ‘ 2 views

cm 3 in comparison to 1.8 g/cm 3 obtained for SiBCN 3 synthesized by polymer pyrolysis. High hardness values up to 22 GPa are found, which might be further increased by reducing the residual hydrogen content by applying higher bias potentials or by reduced precursor flow. ## Experimental The expe