Deposition of carbon films onto metal and silicon substrates by filtered cathodic vacuum arc, plasma enhanced CVD and unbalanced magnetron sputtering

✍ Scribed by Ahmad, I.; Maguire, P.D.; Lemoine, P.; Roy, S.S.; McLaughlin, J.A.

• Book ID: 123231437
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 92 KB
• Volume: 13
• Category: Article
• ISSN: 0925-9635
• DOI: 10.1016/j.diamond.2003.11.026