Deposition of electroceramic thin films
โ
J. Lindner; M. Schumacher; M. Dauelsberg; F. Schienle; S. Miedl; D. Burgess; E.
๐
Article
๐
2000
๐
John Wiley and Sons
๐
English
โ 282 KB
๐ 2 views
MOCVD (metalยฑorganic chemical vapor deposition) of new materials, such as perovskite-type ceramic thin ยฎlms, will be a major key technology in the ยฎeld of ULSI non-volatile and volatile memory applications. This article outlines the latest trends in the ยฎeld of MOCVD equipment and process developmen