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Deposition of Al2O3 and SiO2 Films via Pyrolysis of Aluminum Acetylacetonate and Hexamethyldisiloxane in the Presence of Nitrogen Compounds

✍ Scribed by O.N. Mittov; N.I. Ponomareva; I.Ya. Mittova; E.D. Novikova; T.A. Gadebskaya; M.N. Bezryadin

No coin nor oath required. For personal study only.

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