✦ LIBER ✦

Deposition and structural analyses of molybdenum-disulfide (MoS2)–amorphous hydrogenated carbon (a-C:H) composite coatings

✍ Scribed by Takeno, Takanori; Abe, Shingo; Adachi, Koshi; Miki, Hiroyuki; Takagi, Toshiyuki

Book ID: 120212214
Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 467 KB
Volume: 19
Category: Article
ISSN: 0925-9635
DOI: 10.1016/j.diamond.2009.10.028

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The importance of unbound hydrogen and i

The importance of unbound hydrogen and increased aromatic structure on the friction and wear behaviour of amorphous hydrogenated carbon (a-C:H) coatings

✍ Rabbani, F.; Vogelaar, B.M. 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 532 KB

Electron counting in cluster species. Th

Electron counting in cluster species. The significance of the structure and isomerism of the iron-molybdenum-sulfur cluster compound (dicyclopentadienyldimolybdenum)diron octacarbonyl disulfide, (.eta.5-C5H5)2Mo2Fe2(CO)8S2, a hexanuclear species in which two Mo2FeS tetrahedra share a common molybdenum-molybdenum edge

✍ Fehlner, Thomas P.; Housecroft, Catherine E.; Wade, Kenneth 📂 Article 📅 1983 🏛 American Chemical Society 🌐 English ⚖ 380 KB

Structural characterization of amorphous

Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis

✍ Abhijit Majumdar; Gudrun Scholz; Rainer Hippler 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 321 KB

## analysis (chemical) The chemical composition and bond structure of polymer like amorphous hydrogenated carbon nitride (aH-CN x ) thin films was studied by solid-state 13 C and 1 H MAS NMR spectroscopy, FTIR spectroscopy and elemental analysis. The hydrogenated CN x film was deposited on Si (100

The structure and adhesion of hydrogenat

The structure and adhesion of hydrogenated amorphous carbon (a-C:H) films synthesized on CoCrMo alloy by plasma immersion ion implantation and deposition at different flow ratios of acetylene to argon

✍ Xuejing Zhou; Y.X. Leng; H. Sun; Nan Huang 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 859 KB

Remote hydrogen–nitrogen plasma chemical

Remote hydrogen–nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride filmsElectronic supplementary information (ESI) available: deconvoluted emission and IR spectra of a-Si–N–C–H films. See http://www.rsc.org/suppdata/jm/b2/b211415c/

✍ Wróbel, A. M.; Błaszczyk, I.; Walkiewicz-Pietrzykowska, A.; Tracz, A.; Klemberg- 📂 Article 📅 2003 🏛 Royal Society of Chemistry 🌐 English ⚖ 269 KB