✦ LIBER ✦

Deposition and analysis of Ir-Al coatings for oxidation protection of carbon materials at high temperatures

✍ Scribed by W.M. Clift; K.F. McCarty; D.R. Boehme

Publisher: Elsevier Science
Year: 1990
Tongue: English
Weight: 925 KB
Volume: 42
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(90)90112-p

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Coating composition and the formation of

Coating composition and the formation of protective oxide layers at high temperatures

✍ G. Wahl 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 764 KB

ChemInform Abstract: The Sulfidation and

ChemInform Abstract: The Sulfidation and Oxidation Behavior of Sputter-Deposited Amorphous Al—Nb Alloys at High Temperatures.

✍ H. MITSUI; H. HABAZAKI; K. ASAMI; K. HASHIMOTO; S. MROWEC 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 31 KB 👁 1 views

Application of protective chemically vap

Application of protective chemically vapor deposited coatings on continuous high strength silicon carbide and tungsten filaments for the fabrication of high temperature composites

✍ I. Ahmad; W.J. Heffernan; D.N. Hill 📂 Article 📅 1977 🏛 Elsevier Science 🌐 English ⚖ 36 KB

Structure of TiN coatings deposited at r

Structure of TiN coatings deposited at relatively high rates and low temperatures by magnetron sputtering: V Valvoda et al,Thin Solid Films,156, 1988, 53–63

📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 152 KB

Chemical vapour deposition of the oxides

Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide

✍ Ryan C. Smith; Tiezhong Ma; Noel Hoilien; Lancy Y. Tsung; Malcolm J. Bevan; Luig 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 340 KB 👁 3 views

A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar

The Crucial Role of the K+–Aluminium Oxi

The Crucial Role of the K+–Aluminium Oxide Interaction in K+-Promoted Alumina- and Hydrotalcite-Based Materials for CO2 Sorption at High Temperatures

✍ Stéphane Walspurger; Luciaan Boels; Paul D. Cobden; Gerard D. Elzinga; Wim G. Ha 📂 Article 📅 2008 🏛 Wiley (John Wiley & Sons) 🌐 English ⚖ 408 KB 👁 2 views