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Dependence of InP and GaAs chemical beam epitaxy growth rate on substrate orientations; applications to selective area epitaxy

โœ Scribed by P. Legay; F. Alexandre; J.L. Benchimol; J.C. Harmand


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
519 KB
Volume
150
Category
Article
ISSN
0022-0248

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