✦ LIBER ✦

Dependence of Equilibria in the Modified Chemical Vapor Deposition Process on SiCl4, GeCl4, and O2

✍ Scribed by K.B. McAFEE JR.; K.L. WALKER; R. A. LAUDISE; R.S. HOZACK

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The effects of SiCl4 and GeCl4 oxidation

✍ S. Joh; R. Greif 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 846 KB

Plasma enhanced chemical vapor depositio

✍ A. Ortiz; S. Lopez; C. Falcony; M. Farias; L. Cota-Araiza; G. Soto 📂 Article 📅 1990 🏛 Springer US 🌐 English ⚖ 403 KB

Partition of Hydrogen in the Modified Ch

✍ D. L. WOOD; JAMES S. SHIRK 📂 Article 📅 1981 🏛 John Wiley and Sons 🌐 English ⚖ 384 KB

Simulation of particle transport and dep

✍ Catherine K.W. Cheung; David F. Fletcher; Geoff W. Barton; Pam McNamara 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 591 KB

Thermophoretic Deposition of Small Parti

✍ K. L. WALKER; F. T. GEYLING; S. R. NAGEL 📂 Article 📅 1980 🏛 John Wiley and Sons 🌐 English ⚖ 837 KB

SiO2 prepared by remote plasma-enhanced

✍ A. Ortiz; C. Falcony; M. Farias; L. Cota-Araiza; G. Soto 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 526 KB