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The effects of SiCl4 and GeCl4 oxidation, variable properties, buoyancy and tube rotation on the modified chemical vapor deposition process

✍ Scribed by S. Joh; R. Greif


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
846 KB
Volume
38
Category
Article
ISSN
0017-9310

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