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Dependence of damage efficiency of ions in diamond on electronic stopping

✍ Scribed by E. Friedland; H.D. Carstanjen; G. Myburg; M.A. Nasr

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 187 KB
Volume: 230
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2004.12.030

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It has formerly been shown that low-damage levels, produced during the implantation doping of diamond as a semiconductor, anneal easily while high levels ''graphitize" (above about 5.2 Â 10 15 ions/ cm 2 ). The difference in the defect types and their profiles, in the two cases, has never been direc