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Dependence of catalytic properties of indium-implanted SiO2 thin films on the energy and dose of incident indium ions

โœ Scribed by S. Yoshimura; M. Kiuchi; Y. Nishimoto; M. Yasuda; A. Baba; S. Hamaguchi


Book ID
113937624
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
605 KB
Volume
520
Category
Article
ISSN
0040-6090

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