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Delineation of defects in SIMOX structures using a chemical etching technique

✍ Scribed by L F Giles; A Nejim; P L F Hemment; T W Fan

Book ID
103471588
Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
368 KB
Volume
43
Category
Article
ISSN
0042-207X

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Defect delineation by chemical etching t
Defect delineation by chemical etching techniques in silicon and engineered silicon substrates: Novel chemistries and basic aspects
✍ Kolbesen, Bernd O. ;MΓ€hliß, Jochen ;Possner, Daniel πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 224 KB

## Abstract Preferential etching techniques in combination with light optical microscopy are still the workhorse for the evaluation of defect types and area densities in engineered silicon substrates such as silicon‐on‐insulator (SOI) wafers. Most etching recipes are based on chromium (VI) compound