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A new chemical etch for defects studies in very thin film (< 1000 Å) SIMOX material

✍ Scribed by L.F. Giles; A. Nejim; P.L.F. Hemment


Book ID
113300293
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
694 KB
Volume
35
Category
Article
ISSN
0254-0584

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