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Dehydroxylation action on surface of TiO2films restrained by nitrogen carrier gas during atomic layer deposition process

✍ Scribed by Rao, Zhi-Peng; Liu, Bang-Wu; Li, Chao-Bo; Xia, Yang; Wan, Jun

Book ID: 121569209
Publisher: Nonferrous Metals Society of China
Year: 2014
Tongue: English
Weight: 305 KB
Volume: 33
Category: Article
ISSN: 1001-0521
DOI: 10.1007/s12598-013-0206-y

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