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Defect production, annealing and electrical activation in Si+ implanted InP

✍ Scribed by E. Wendler; P. Müller; T. Bachmann; W. Wesch

Book ID: 113284760
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 361 KB
Volume: 80-81
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(93)96215-x

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