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Defect formation in amorphous SiO2 by ion implantation: Electronic excitation effects and chemical effects

โœ Scribed by Hideo Hosono; Noriaki Matsunami


Book ID
114170121
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
270 KB
Volume
141
Category
Article
ISSN
0168-583X

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