Deep, three dimensional lithography with a laser-plasma X-ray source at 1nm wavelength

✍ Scribed by ICE Turcu; CM Mann; SW Moon; R Allott; N Lisi; BJ Maddison; SE Huq; NS Kim

• Book ID: 104306307
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 660 KB
• Volume: 35
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(96)00151-7

✦ Synopsis

Soft x-rays with lnm wavelength are used to print 48~tm deep structures in chemically amplified resist. A multiple exposure/development technique reduces the x-ray exposure time to a total of 10min when using a compact, laser-plasma x-ray source. The use of an embedded mask generates a true three dimensional structure. Only 2tam thick x-ray masks are used with such soft x-rays. A 2.5THz waveguide cavity is fabricated using this novel process.