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Deep and fast plasma etching for silicon micromachining

✍ Scribed by M. Francou; J.S. Danel; L. Peccoud

Book ID: 108028254
Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 383 KB
Volume: 46
Category: Article
ISSN: 0924-4247
DOI: 10.1016/0924-4247(94)00852-9

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