𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Damage formation in Ge during Ar+ and He+ implantation at 15 K

✍ Scribed by M. Hayes; A. Schroeter; E. Wendler; W. Wesch; F.D. Auret; J.M. Nel


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
356 KB
Volume
404
Category
Article
ISSN
0921-4526

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Radiation damage in ZnO ion implanted at
✍ E. Wendler; O. Bilani; K. GΓ€rtner; W. Wesch; M. Hayes; F.D. Auret; K. Lorenz; E. πŸ“‚ Article πŸ“… 2009 πŸ› Elsevier Science 🌐 English βš– 383 KB
Solubility of gases in liquids. 21. Solu
✍ Paul J. Hesse; Rubin Battino; Pirketta Scharlin; Emmerich Wilhelm πŸ“‚ Article πŸ“… 1999 πŸ› Elsevier Science 🌐 English βš– 112 KB

The Ostwald coefficients L 2,1 of He, Ne, Ar, Kr, N 2 , O 2 , CH 4 , CF 4 , and SF 6 dissolved in 2,2,4-trimethylpentane (isooctane) have been measured at the temperature 298.15 K and the pressure 101325 Pa with a modified Ben-Naim/Baer-type apparatus. Subsequently, the L 2,1 values are converted to