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Crystal Growth Technology || Influence of Boron Addition on Oxygen Behavior in Silicon Melts

โœ Scribed by Scheel, Hans J.; Fukuda, Tsuguo


Book ID
121087092
Publisher
John Wiley & Sons, Ltd
Year
2003
Weight
147 KB
Category
Article
ISBN-13
9780470871683

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## Abstract The development of diamond based devices for high power electronic applications requires the growth of thick heavily boron doped diamond. During the growth of CVD single crystals, the final form of the film depends on the different crystalline faces growth rate with respect to each othe