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Cover Picture: High-Resolution Soft Lithography: Enabling Materials for Nanotechnologies (Angew. Chem. Int. Ed. 43/2004)

✍ Scribed by Jason P. Rolland; Erik C. Hagberg; Ginger M. Denison; Kenneth R. Carter; Joseph M. De Simone

Publisher: John Wiley and Sons
Year: 2004
Tongue: English
Weight: 56 KB
Volume: 43
Category: Article
ISSN: 0044-8249
DOI: 10.1002/anie.200490149

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✦ Synopsis

High‐performance imprint lithographic applications are ideally suited for perfluoropolyether‐based elastomers. The cover picture shows sub‐100‐nm sized features replicated by these materials whose successful application comes from their remarkably low surface energy and their high flexibility. The performance of the materials suggests that replication at even smaller sizes may be possible. For more information, see the Communication by J. M. De Simone, K. R. Carter, and co‐workers on page 5796 ff.

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