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Cover Picture: High-Resolution Soft Lithography: Enabling Materials for Nanotechnologies (Angew. Chem. Int. Ed. 43/2004)

✍ Scribed by Jason P. Rolland; Erik C. Hagberg; Ginger M. Denison; Kenneth R. Carter; Joseph M. De Simone


Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
56 KB
Volume
43
Category
Article
ISSN
0044-8249

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✦ Synopsis


High‐performance imprint lithographic applications are ideally suited for perfluoropolyether‐based elastomers. The cover picture shows sub‐100‐nm sized features replicated by these materials whose successful application comes from their remarkably low surface energy and their high flexibility. The performance of the materials suggests that replication at even smaller sizes may be possible. For more information, see the Communication by J. M. De Simone, K. R. Carter, and co‐workers on page 5796 ff.


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