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Titelbild: High-Resolution Soft Lithography: Enabling Materials for Nanotechnologies (Angew. Chem. 43/2004)

✍ Scribed by Jason P. Rolland; Erik C. Hagberg; Ginger M. Denison; Kenneth R. Carter; Joseph M. De Simone

Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
55 KB
Volume
116
Category
Article
ISSN
0044-8249

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Cover Picture: High-Resolution Soft Lith
Cover Picture: High-Resolution Soft Lithography: Enabling Materials for Nanotechnologies (Angew. Chem. Int. Ed. 43/2004)
✍ Jason P. Rolland; Erik C. Hagberg; Ginger M. Denison; Kenneth R. Carter; Joseph 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 56 KB

**High‐performance imprint** lithographic applications are ideally suited for perfluoropolyether‐based elastomers. The cover picture shows sub‐100‐nm sized features replicated by these materials whose successful application comes from their remarkably low surface energy and their high flexibility. T