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Correlation between the diffusive and electrical barrier properties of the interface in polysilicon contacted n+-p junctions

✍ Scribed by Stork, J.M.C.; Arienzo, M.; Wong, C.Y.

Book ID: 114595264
Publisher: IEEE
Year: 1985
Tongue: English
Weight: 463 KB
Volume: 32
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1985.22194

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