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Correlation between ion beam parameters and physical characteristics of nanostructures fabricated by focused ion beam

✍ Scribed by Sarvesh K. Tripathi; Neeraj Shukla; Vishwas N. Kulkarni

Book ID
118492099
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
402 KB
Volume
266
Category
Article
ISSN
0168-583X

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Highly (0 0 2)-oriented AlN film was deposited on n-type (1 0 0)-oriented silicon substrates by the radio frequency magnetron sputtering method. An individual AlN cone with high aspect ratio was fabricated by the focused ion-beam (FIB) etching process in the surface of an as-formed AlN film. This et