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Copper(I) tert -Butyl 3-Oxobutanoate Complexes as Precursors for Chemical Vapor Deposition of Copper

✍ Scribed by Choi, Hyungsoo; Hwang, Soontaik

Book ID
127013663
Publisher
American Chemical Society
Year
1998
Tongue
English
Weight
39 KB
Volume
10
Category
Article
ISSN
0897-4756

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Copper(I), silver(I) and gold(I) carboxy
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✍ A. Grodzicki; I. Łakomska; P. Piszczek; I. SzymaΕ„ska; E. SzΕ‚yk πŸ“‚ Article πŸ“… 2005 πŸ› Elsevier Science 🌐 English βš– 892 KB

Volatile precursors of copper, silver and gold for chemical vapour deposition (CVD) of metallic layers are described. There is considerable research interest in CVD because it provides advantages such as selective deposition, control of film density and thickness, etc. over other physical deposition