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Synthesis and Characterization of Copper(I) Amidinates as Precursors for Atomic Layer Deposition (ALD) of Copper Metal

✍ Scribed by Li, Zhengwen; Barry, Seán T.; Gordon, Roy G.


Book ID
120060763
Publisher
American Chemical Society
Year
2005
Tongue
English
Weight
229 KB
Volume
44
Category
Article
ISSN
0020-1669

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Volatile precursors of copper, silver and gold for chemical vapour deposition (CVD) of metallic layers are described. There is considerable research interest in CVD because it provides advantages such as selective deposition, control of film density and thickness, etc. over other physical deposition