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Copper precipitation in long-time processed transistor samples

โœ Scribed by Dr. R. Gleichmann; Dr. O. Breitenstein; Dr. sc. U. Mohr

Publisher
John Wiley and Sons
Year
1983
Tongue
English
Weight
690 KB
Volume
18
Category
Article
ISSN
0232-1300

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Institiit fur Festkorpcrphysik und Elcktroncnmikroskopie der Akadcmie dcr Tl'issonschaften der DDR, IIalle, und VEB Gleichrichterwcrlc Stahnsdorf ## Copper Precipitation in Longtime Diffused Silicon The generation of microdefects in FZ-silicon during long-time high-temperature processing, necessa