Institiit fur Festkorpcrphysik und Elcktroncnmikroskopie der Akadcmie dcr Tl'issonschaften der DDR, IIalle, und VEB Gleichrichterwcrlc Stahnsdorf ## Copper Precipitation in Longtime Diffused Silicon The generation of microdefects in FZ-silicon during long-time high-temperature processing, necessa
โฆ LIBER โฆ
Copper diffusivity in silicon: A re-examination
โ Scribed by A. Mesli; T. Heiser; E. Mulheim
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 548 KB
- Volume
- 25
- Category
- Article
- ISSN
- 0921-5107
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