High resolution depth profiling in silic
High resolution depth profiling in silicon oxynitride films using narrow nuclear reaction resonances
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L.G. Gosset; J.-J. Ganem; I. Trimaille; S. Rigo; F. Rochet; G. Dufour; F. Jolly;
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Article
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1998
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Elsevier Science
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English
โ 624 KB