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Control of Cl2 plasma by electron-beam-excited plasma and poly-Si etching

✍ Scribed by Yasuhiro Mikawa; Ryu-ichi Miyano; Jun-ichi Inaguma; Yasunori Shiraki; Futoshi Mutsuga; Motoyuki Fujii; Shunjiro Ikezawa

Book ID: 108390463
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 629 KB
Volume: 51
Category: Article
ISSN: 0042-207X
DOI: 10.1016/s0042-207x(98)00248-6

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