✦ LIBER ✦
Deep Plasma Etching of Si in a CBrF3 Plasma through a Submicron Single Layer Electron-Beam Lithographic Mask
✍ Scribed by Huran, J. ;Horniaková, A. ;HašČík, Š.
- Publisher
- John Wiley and Sons
- Year
- 1992
- Tongue
- English
- Weight
- 214 KB
- Volume
- 132
- Category
- Article
- ISSN
- 0031-8965
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