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Continuous chemical vapour deposition of tin oxide

โœ Scribed by R Kalbskopf


Publisher
Elsevier Science
Year
1981
Tongue
English
Weight
92 KB
Volume
77
Category
Article
ISSN
0040-6090

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Atmospheric pressure chemical vapour dep
โœ Joanne E. Stanley; Anthony C. Swain; Kieran C. Molloy; David W. H. Rankin; Heath ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 251 KB ๐Ÿ‘ 1 views

13 , n = 1) have been synthesized, characterized by 1 H, 13 C, 19 F and 119 Sn NMR, and evaluated as precursors for the atmospheric pressure chemical vapour deposition of fluorine-doped SnO 2 thin films. All precursors were sufficiently volatile in the range 84-136 โ€ข C and glass substrate temperatur