In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded fro
โฆ LIBER โฆ
Consumption optimization by Run to Run control with zone control
โ Scribed by Tian-Hong Pan; Bi-Qi Sheng; David Shan-Hill Wong; Shi-Shang Jang
- Book ID
- 108197154
- Publisher
- Elsevier
- Year
- 2010
- Tongue
- English
- Weight
- 427 KB
- Volume
- 41
- Category
- Article
- ISSN
- 1876-1070
No coin nor oath required. For personal study only.
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Run-to-run control of a plasma etch process for 8 inch diameter silicon wafers at Digital Semiconductor is determined by maintenance of targeted values of post-etch metrology variables. The post-etch quality variables are extremely sensitive to variation in the etch chamber conditions due to fluctua